Poster # 506

M. Engel ¹, C. O., Hale ⁴, F. K., Crutcher ², X. Cai ³, A. C. Hogg ¹, and M, J. Giroux ¹
1. Department of Plant Sciences and Plant Pathology, Montana State University, Bozeman, Montana
2. Department of Research Centers, Montana State University, Sidney, Montana
3. USDA-ARS Wheat, Sorghum, and Forage Research Unit, Lincoln, Nebraska
4. Department of Crop and Soil Science, Oregon State University, Corvallis, Oregon
Corresponding Author: Mike Giroux, mgiroux@montana.edu

Engel, Megan

megan.engel@student.montana.edu

Montana ranks second in U.S. durum (Triticum turgidum subsp. durum) wheat production, with about 250,000 hectares grown annually. Rain during the growing season increases Fusarium Head Blight (FHB) incidence and elevates deoxynivalenol (DON) levels. Since complete resistance to FHB is unavailable, pyramiding known resistance genes offers the most effective management strategy. To combat FHB in durum, we have developed populations by crossing durum with hexaploid wheat lines carrying Fhb1 and Fhb5. Additionally, to decrease FHB infection and DON even further, we are also collaborating to introgress Fhb7^The2, a Thinopyrum elongatum-derived resistance gene, into durum. All resistance genes were tracked using KASP markers in greenhouse trials, followed by multi-year field evaluations at Montana State University’s Eastern Agricultural Research Center (EARC) in Sidney, MT—Montana’s primary durum-growing region. In 2024, field tests of eight populations totaling 176 genotypes with at least one fixed Fhb1 or Fhb5 resistance gene identified individuals with varying DON levels. From these genotypes, a third of the individuals with lowest DON levels were selected and advanced for field testing in 2025, with results to be presented. Further, a durum genotype with Fhb7^The2 was tested in the field for FHB resistance in 2025 with results forthcoming. Developing and releasing FHB-resistant lines with improved yield and reduced DON levels is essential to sustain high-yielding durum production in the state.

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